Osiris勻膠機

Systems for processing single-wafers with customized substrate processing options for semiconductor and microsystems technology.

SPIN COATER - CCP

Designed to be used in applications:
SPIN  COATING with Covered Chuck Processor (CCP)

1. UNIXX S760+
(21x21 inch) Stand-alone system
spin coater for large substrates.

2. UNIXX SA30+
(?300mm) Stand-alone system with
covered chuck spin coater. (single base frame)

3. UNIXX SHp22+
(?200mm) Stand-alone system with
covered chuck spin coater & hotplate module.

SPIN COATER - open bowl

Designed to be used in applications:
SPIN  COATING with open-bowl for standard coating.

1. UNIXX SA30
(?300mm) Stand-alone system with
open bowl spin coater. (single base frame)

2. UNIXX SHe22
(?200mm) Stand-alone system with
open bowl spin coater & hotplate module.