化工儀器網(wǎng)>產(chǎn)品展廳>配件耗材>其它儀器配件耗材>其它儀器配件>21597-10 PELCO氮化硅支撐膜

21597-10 PELCO氮化硅支撐膜

參考價(jià)	￥ 11
訂貨量	≥1 件

具體成交價(jià)以合同協(xié)議為準(zhǔn)

公司名稱 桑戈國(guó)際貿(mào)易（上海）有限公司
品牌 其他品牌
型號(hào) 21597-10
產(chǎn)地 美國(guó)
廠商性質(zhì) 代理商
更新時(shí)間 2021/1/27 14:53:11
訪問(wèn)次數(shù) 1794

產(chǎn)品標(biāo)簽

耗材 Silicon Nitride Sup

在線交流發(fā)送詢價(jià) 查看電話同類產(chǎn)品

聯(lián)系我們時(shí)請(qǐng)說(shuō)明是化工儀器網(wǎng)上看到的信息，謝謝!

索取相關(guān)資料

公司介紹 主營(yíng)產(chǎn)品

桑戈國(guó)際貿(mào)易（上海）有限公司是一家銷售國(guó)內(nèi)外生化試劑、實(shí)驗(yàn)耗材，并向客戶提供技術(shù)支持服務(wù)的生物科技公司。公司秉承“以客戶為中心、視質(zhì)量為生命、以信譽(yù)求發(fā)展”的發(fā)展理念，在客戶的大力支持和公司員工的不懈努力下取得了快速的成長(zhǎng)。公司努力將產(chǎn)品及時(shí)介紹給廣大客戶。"以信譽(yù)求發(fā)展"與廣大客戶建立信任關(guān)系，與科研工作者一起為生物技術(shù)而努力。

桑戈公司代理20多家歐美生物技術(shù)公司產(chǎn)品，銷售的實(shí)驗(yàn)儀器、消耗品、分子生化試劑、免疫試劑和細(xì)胞培養(yǎng)試劑等，應(yīng)用于生命科學(xué)基礎(chǔ)研究、開發(fā)應(yīng)用、制藥、疾病診斷與控制、人口與健康、生物技術(shù)等諸多領(lǐng)域。公司客戶遍布大學(xué)、研究所、醫(yī)院、衛(wèi)生防疫、商品檢驗(yàn)檢疫、制藥公司、生物技術(shù)公司和食品工業(yè)等單位。公司不但擁有一批掌握現(xiàn)代科技的市場(chǎng)人員，還有一支訓(xùn)練有素的技術(shù)支持隊(duì)伍。公司在美國(guó)還有顧問(wèn)團(tuán)隊(duì)，顧問(wèn)團(tuán)隊(duì)由美國(guó)各大學(xué)從事生物醫(yī)學(xué)研究的博士后，博士和技術(shù)人員組成。隨時(shí)為您提供技術(shù)咨詢、及售后服務(wù)。

展開

ATCC菌種、質(zhì)控菌株、標(biāo)準(zhǔn)菌株、微生物菌種、CMCC菌株

詳細(xì)信息 在線詢價(jià)

供貨周期	一個(gè)月	應(yīng)用領(lǐng)域	醫(yī)療衛(wèi)生,環(huán)保,化工,生物產(chǎn)業(yè),石油

PELCO氮化硅支撐膜

The PELCO^® Silicon Nitride Support Films for TEM （also called Si3N4 TEM membranes） have been developed as an addition to our extensive range of TEM support films to further enable nanotechnology applications and extend molecular biology research. These superior products are made by state-of-the-art semiconductor and patented MEMS fabrication techniques using resilient, low-stress inorganic silicon nitride thin films supported by a sturdy silicon frame. PELCO^® Silicon Nitride Support Films are available in four window sizes combined with either 8, 15, 35, 50nm, or 200nm thin membrane thickness on an EM industry standard 3mm diameter round frame, making them the most desirable and useful silicon nitride support films in the current marketplace. Go to Product Overview and Manufacturing Details for more information

Silicon Nitride Support Films have the advantages of being chemically and mechanically robust and can withstand temperature changes up to 1000°C. They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films.

The PELCO^® Silicon Nitride Support Films are indispensable tools for virtually all fields of nanotechnology research. They enable direct deposition and in situ observations of dynamic reactions over a wide temperature range. The support film can be used as a passive support film but can also play a role as an active participant in experiments.

Hydrophobic and Hydrophilic Substrates have been added for nanotechnology and biotechnology applications. The ultra-low-stress 15nm, 50nm, and 200nm membranes have been Atomic Layer-Deposited （ALD） to create these surfaces: go to Hydrophobic / Hydrophilic support films.

Iron nanoparticles dispersed on a SiN support film and oxidized at 350°C while supported on the PELCO^® SiN support films. The image shows the product of the oxidization process: hollow iron oxide nanoparticles.
Haitao Liu, Dept. of Chemistry, UC Berkeley, California.

PELCO^® Silicon Nitride Support Films are manufactured using state-of-the-art semiconductor and MEMS manufacturing techniques. The Silicon Nitride Support Film is grown on a silicon wafer to the desired membrane thickness of 8, 15, 35, 50, or 200nm. The specimen viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, resilient and chemically robust silicon nitride film. The frame is manufactured as a 3mm silicon disc with smooth EasyGrip™ edges for easy manipulation by tweezers and will fit perfectly in standard TEM holders. Standard thickness of the silicon frame is 200µm which will fit most TEM holders. A special version with a 50µm thickness and a 0.25 x 0.25mm window is available for special TEM holders which only accommodate thinner supports. Easy handling capabilities and smoothness of the edges are design advantages over other brands of silicon nitride support films. The PELCO^® Silicon Nitride Support Films are manufactured like grids and are compley free from debris particles. The mechanical and chemical stability allow for cleaning of the Silicon Nitride Support Films with chemicals （solvents, acids and bases）, glow discharge and plasma cleaning. It is recommended that ultrasonic cleaning not be used, as it can easily shatter the Silicon Nitride Support Films.


Monte Carlo simulations showing less absorption and less scattering in 50nm Silicon Nitride Support Films; Advantage - PELCO^®50nm film thickness gives superior imaging and analysis results.

Advantages of the PELCO^® Silicon Nitride Support Films

Resilient, ultra-low-stress 8, 15, 35 or 50nm Silicon Nitride Support Film
- The relatively sturdy Silicon Nitride Support Film allows direct deposition of materials and/or manipulation of specimens
- Largest viewing area for 50nm film thickness
- 8 and 15nm film thickness without pinholes for ultra high resolution TEM applications
Robust, low-stress 200nm Silicon Nitride Support Film
- Stronger membrane for multiple handling
Special window for TEM tomography applications
- Large （0.5x1.5mm） windows designed primarily for high-tilt tomography applications allowing up to 75° tilt
Multiple window version
- 2 separate 0.1 x 1.5mm windows on one single frame
- 3x3 array gives 9 separate 0.1 x 0.1mm windows on one single frame
- 25 apertures on a 0.5x0.5mm window, ideal for multiple samples
Multiple microscopy techniques capability
- The mechanical stability allows for multiple microscopy techniques like TEM, SEM, EDX, XPS and AFM on the same silicon nitride support film.
Films are resistant to solvents, acids and bases
- Specimen can be studied, synthesized or manipulated under acidic or basic conditions
Silicon Nitride Support Films are ideal for high temperature experiments
- Films withstand temperatures up to 1000°C
The PELCO^® Silicon Nitride Support Films provide more accurate analysis of specimens containing carbon, and reduce contamination
- Carbon-free background for TEM imaging and analysis
Films can be easily cleaned
- The mechanical and chemical stability allow the Silicon Nitride Support Films to be easily cleaned using glow discharge of plasma cleaning techniques
Ultra-flat background support film
- Ideal substrate for deposition of nanoparticles and thin films
- Perfect for SEM imaging due to the absence of background structure
Clean manufacturing avoids debris particles on support films
- The PELCO^® Silicon Nitride Support Films have no broken edges and are free from debris. Furthermore they are packaged under class 100 （US Fed Standard 209E） clean room conditions
Frame thickness of 200 and 50µm
- 200µm for standard TEM grid holders
- 50µm for special TEM grid holders
Industry standard 3mm diameter round frame
- Fits exactly in standard TEM holders and provides EasyGrip™ edges for handling. Also provides a more sturdy silicon frame.
All PELCO^® Silicon Nitride Support Films from the same batch have identical properties
- Ideal for large series of comparison studies
Also available with Hydrophilic/Hydrophobic modified surfaces and as Holey Membranes.

Applications Fields:

Cell biology: attached cells can be grown in their environment on the support film and subsequently analyzed
Analysis of colloids, aerosols, nanoparticles
Self-assembled mono-layers
Polymer research
Thin film research （directly deposited on the Silicon Nitride Support Film）
Materials science
Properties of nano-structures for semiconductor devices
Semiconductor: characterization of thin films
Catalyst development

a	b	c
（a）（b） Single slice electron tomogram of a single synapse in （a） where synaptic vesicles and microtubules can be clearly discerned. （c） Three-dimensional model of the tomographic data in （b） created by the use of the IMOD suite of programs. Prof. M. Stowell, et. al., MCDB, CU-Boulder, Colorado.

Product Description
Defining parameters for the PELCO^® Silicon Nitride Support Films are:

Film Thickness: Resilient, ultra-low-stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;
Window Sizes: 0.25x0.25mm, 0.5x0.5mm, 0.75x0.75mm, 1.0x1.0mm, 0.5x1.5mm and multiple window versions with 9 windows of 0.1x0.1mm in a 3x3 array or 2 windows of 0.1x1.5mm. Larger windows give a greater viewing area and for example, allow for the higher tilt angles required for tomography applications. The versions with the multiple windows allows for mounting multiple samples on separate windows;
Window/Aperture Size for Ultra-Thin, 8nm Film: Window size is 0.5 x 0.5mm with 25 apertures of 60 x 60µm on a 200nm silicon nitride support mesh. Bar width 35µm, edge 30µm （go to Manufacturing Details）.
Window/Aperture Size for Resilient 35nm Film: Window size is 0.5x0.5mm with 25 apertures of 70x70µm on a 200nm support mesh. Bar width 25µm, edge 25µm （go to Manufacturing Details）.
Frame Thickness: Silicon support structure is 200µm standard. This allows for fitting in all standard TEM holders and gives a sturdy support frame. 50µm is also available for special TEM holders.
Surface Roughness: The RMS （Rq） is 0.65 +/- 0.06nm which gives a mean roughness （Ra） of 0.45 +/- 0.02nm;
Frame Diameter: EM standard 3mm diameter disc, fully compatible with TEM holders and with EasyGrip™ edges for improved handling;
Packaging: The PELCO^® Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO^® #160 TEM Grid Storage Box. Each box holds 10 support films.

Prod #	Description	Unit
8nm membrane thickness / 25 apertures / 200µm frame thickness
21510-10	Silicon Nitride Support Film, 8nm, 60x60µm Apertures （25） on 0.5x0.5mm Window	pkg/10
15nm membrane thickness / 200µm frame thickness
21560-10	Silicon Nitride Support Film, 15nm with 0.25x0.25mm Window	pkg/10
21568-10	Silicon Nitride Support Film, 15nm with 2 each 0.1x1.5mm Windows	pkg/10
21569-10	Silicon Nitride Support Film, 15nm with 9 each 0.1x0.1mm Windows	pkg/10
35nm membrane thickness / 25 apertures / 200µm frame thickness
21515-10	Silicon Nitride Support Film, 35nm, 70x70µm aperture （25） on 0.5x0.5mm Window	pkg/10
50nm membrane thickness / 200µm frame thickness
21505-10	Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window	pkg/10
21505-100	Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window	pkg/100
21500-10	Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window	pkg/10
21500-100	Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window	pkg/100
21501-10	Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window	pkg/10
21501-100	Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window	pkg/100
21502-10	Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window	pkg/10
21502-100	Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window	pkg/100
21504-10	Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window	pkg/10
21504-100	Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window	pkg/100
21508-10	Silicon Nitride Support Film, 50nm with 2 each 0.1x1.5mm Windows	pkg/10
21509-10	Silicon Nitride Support Film, 50nm with 9 each 0.1x0.1mm Windows	pkg/10
200nm membrane thickness / 200µm frame thickness
21525-10	Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window	pkg/10
21525-100	Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window	pkg/100
21520-10	Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window	pkg/10
21520-100	Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window	pkg/100
21521-10	Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window	pkg/10
21521-100	Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window	pkg/100
21522-10	Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window	pkg/10
21522-100	Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window	pkg/100
21524-10	Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window	pkg/10
21524-100	Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window	pkg/100
21528-10	Silicon Nitride Support Film, 200nm with 2 each 0.1x1.5mm Windows	pkg/10
21529-10	Silicon Nitride Support Film, 200nm with 9 each 0.1x0.1mm Windows	pkg/10
21570-10	Silicon Nitride Support Film, 50nm on 50µm frame thickness with 0.25x0.25mm Window	pkg/10
21578-10	Silicon Nitride Support Film, 50nm on 50µm frame thickness with 2 each 0.1x1.5mm Windows	pkg/10
21579-10	Silicon Nitride Support Film, 50nm on 50µm frame thickness with 9 each 0.1x0.1mm Windows	pkg/10

The Silicon Nitride Assortment Pack

with various membrane thicknesses and sizes

The Silicon Nitride Assortment Pack is the ideal way to determine which membrane thickness or size of silicon nitride or silicon dioxide is the optimum product for your application. The assortment pack includes the following thickness and window sizes on 200um thick silicon frames:

Position In Grid Box	Unit	Membrane Type
1A	1 ea	Si3N4 15nm membrane with 0.25x0.25mm window
1B	1 ea	1 ea Si3N4 15nm membrane with 0.25x0.25mm window
1C	1 ea	1 ea Si3N4 50nm membrane with 0.25x0.25mm window
1D	1 ea	1 ea Si3N4 50nm membrane with 9 ea 0.1x0.1mm windows
1E	1 ea	Si3N4 50nm membrane with 0.5x0.5mm window
2A	1 ea	Si3N4 50nm membrane with 0.75x0.75mm window
2B	1 ea	Si3N4 200nm membrane with 0.25x0.25mm window
2C	1 ea	Si3N4 200nm membrane with 0.5x0.5mm window
2D	1 ea	SiO2 40nm membrane with 0.5x0.5mm window
2E	1 ea	Holey Si3N4 200nm membrane with 2.5µm holes with 0.5x0.5mm window

Prod #	Description	Unit
21597-10	Silicon Nitride Assortment Pack （10 different membranes）	each

該廠商的其他產(chǎn)品

21553-10 親水性/疏水性氮化硅支持膜

国产精品视频一区二区三区四,亚洲av美洲av综合av,99国内精品久久久久久久,欧美电影一区二区三区电影

21597-10 PELCO氮化硅支撐膜

公司介紹 主營(yíng)產(chǎn)品