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邁可諾技術(shù)有限公司
主營(yíng)產(chǎn)品： 美國(guó)Laurell勻膠機(jī),WS1000濕法刻蝕機(jī),Cargille光學(xué)凝膠,EDC-650顯影機(jī),NOVASCAN紫外臭氧清洗機(jī) |
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邁可諾技術(shù)有限公司
主營(yíng)產(chǎn)品： 美國(guó)Laurell勻膠機(jī),WS1000濕法刻蝕機(jī),Cargille光學(xué)凝膠,EDC-650顯影機(jī),NOVASCAN紫外臭氧清洗機(jī) |
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Osiris勻膠機(jī)
Systems for processing single-wafers with customized substrate processing options for semiconductor and microsystems technology.
Designed to be used in applications:
SPIN COATING with Covered Chuck Processor (CCP)
1. UNIXX S760+
(21x21 inch) Stand-alone system
spin coater for large substrates.
2. UNIXX SA30+
(?300mm) Stand-alone system with
covered chuck spin coater. (single base frame)
3. UNIXX SHp22+
(?200mm) Stand-alone system with
covered chuck spin coater & hotplate module.
Designed to be used in applications:
SPIN COATING with open-bowl for standard coating.
1. UNIXX SA30
(?300mm) Stand-alone system with
open bowl spin coater. (single base frame)
2. UNIXX SHe22
(?200mm) Stand-alone system with
open bowl spin coater & hotplate module.
